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Title:
POSITIVE TYPE PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP2001166482
Kind Code:
A
Abstract:

To provide a positive type photoresist composition having high sensitiv ity and high resolving power, giving a rectangular resist pattern, having good wettability with a developing solution and nearly free from development defects.

The positive type photoresist composition contains an acid decomposable polymer containing repeating units of formulae I and II (where Y is H, methyl, cyano or Cl; s L and M are each a single bond or a divalent combining group; R', R'' and R''' are each alkyl, phenyl, trialkylsilyl or trialkylsilyloxy; Ra is H or alkyl; and Z is a group of atoms forming a lactone structure together with C to which Z bonds) and having solubility to an alkali developing solution increased by the action of an acid.


Inventors:
MIZUTANI KAZUYOSHI
SATO KENICHIRO
Application Number:
JP35050699A
Publication Date:
June 22, 2001
Filing Date:
December 09, 1999
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
H01L21/027; C08F220/12; C08F220/26; C08K5/00; C08L33/14; G03F7/039; G03F7/075; (IPC1-7): G03F7/039; C08F220/12; C08K5/00; C08L33/14; G03F7/075; H01L21/027
Attorney, Agent or Firm:
Tadashi Hagino (4 outside)