Title:
POSITIVE TYPE PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3436782
Kind Code:
B2
Abstract:
PURPOSE: To ensure excellent characteristics such as sensitivity, resolution, depth of a focus and heat resistance and to control standing wave effect by blending alkali-soluble novolac resin with a specified ester compd. and a phenolic compd. represented by a specified formula.
CONSTITUTION: This positive type photoresist compsn. contains alkali-soluble novola resin, an ester compd. of naphthoquinone-1,2-diazido-sulfonic acid and a phenolic compd. represented by formula I or II. In the formula I, R1 is 1-12C alkyl or 7-10C aralkyl. In the formula II, R2 is 1-5C alkyl, (n) is an integer of 1-5, and in the case of n$2, plural R2's may be different from each other. The ester compd. of naphthoquinone-1,2-diazidosulfonic acid is, e.g. an ester compd. of naphthoquinone-1,2-diazido-5-sulfonic acid or naphthoquinone-1,2- diazido-4-sulfonic acid.
Inventors:
Suguru Nakao
Remi Numata
Kousuke Doi
Nobuo Tokutake
Hidekatsu Kohara
Toshimasa Nakayama
Remi Numata
Kousuke Doi
Nobuo Tokutake
Hidekatsu Kohara
Toshimasa Nakayama
Application Number:
JP28357993A
Publication Date:
August 18, 2003
Filing Date:
November 12, 1993
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/004; G03F7/022; H01L21/027; (IPC1-7): G03F7/022; G03F7/004; H01L21/027
Domestic Patent References:
| JP643649A | ||||
| JP5333540A | ||||
| JP5880636A | ||||
| JP1133045A |
Attorney, Agent or Firm:
Agata Akira (1 person outside)