Title:
POSITIVE TYPE PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3870502
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a chemical amplification type positive type photoresist compsn. excellent in various properties such as sensitivity, resolution, heat resistance, the rate of a residual film, coating property and a profile and excellent also in resistance to time delay effect.
SOLUTION: This photoresist compsn. contains a resin (A) which is made alkali-soluble by the action of acid from an alkali-insoluble or slightly alkali- soluble state, an acid generating agent (B) and a dipyridyl compd. (C) represented by the formula (where Z is an org. combining group having at least one hetero atom and each of R1-R6 is H or 1-4C alkyl independently) or further contains an electron donor (D) having a ≤1.7 eV oxidation-reduction potential.
Inventors:
Nobuto Fukui
Yuko Yako
Hiroshi Takagaki
Kenji Takahashi
Yuko Yako
Hiroshi Takagaki
Kenji Takahashi
Application Number:
JP23367197A
Publication Date:
January 17, 2007
Filing Date:
August 29, 1997
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP7134419A | ||||
| JP3241354A | ||||
| JP10171120A |
Attorney, Agent or Firm:
Takashi Kuboyama