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Title:
POSITIVE TYPE PHOTORESIST COMPOSITION
Document Type and Number:
Japanese Patent JP3894260
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a chemical amplification type positive type photoresist composition free from the occurrence of a stationary wave and a development defect, having high sensitivity and excellent in resolving power by incorporating a compound which has a specified group, is decomposed by the action of an acid and increases its solubility in an alkali developing solution and a compound which generates the acid when it is irradiated with active light or radiation.
SOLUTION: The photoresist composition contains a compound which has an acid decomposable group having a specified structure, that is, a compound which has a group of the formula, is decomposed by the action of an acid and increases its solubility in an alkali developing solution and a compound which generates the acid when it is irradiated with active light or radiation. In the formula, R1 and R2 may be the same or different and are each H or 1-4C alkyl, X is optionally substituted 1-20C alkylene, Y is a divalent combining group and Z is an optionally substituted heterocyclic group.


Inventors:
Toru Fujimori
Shiro Tan
Application Number:
JP16586299A
Publication Date:
March 14, 2007
Filing Date:
June 11, 1999
Export Citation:
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Assignee:
FUJIFILM Corporation
International Classes:
G03F7/039; H01L21/027; C07C43/225; C07C69/76; C07C205/11; C07C309/19; C07C309/31; C07C309/38; C07C309/39; C07C309/43; C07C309/44; C07C309/47; C07C309/58; C07C317/12; C07C317/14; C07C317/22; C07C321/20; C07C321/28; (IPC1-7): G03F7/039; C07C43/225; C07C69/76; C07C205/11; C07C309/19; C07C309/31; C07C309/38; C07C309/39; C07C309/43; C07C309/44; C07C309/47; C07C309/58; C07C317/12; C07C317/14; C07C317/22; C07C321/20; C07C321/28; H01L21/027
Domestic Patent References:
JP10221854A
JP11015161A
JP11109629A
Attorney, Agent or Firm:
Shohei Oguri
Hironori Honda
Toshimitsu Ichikawa
Takeshi Takamatsu
Kiyozumi Yazawa