PURPOSE: To provide the subject composition high in photosensitivity, capable of giving good resist patterns with little residual development, comprising a compound having group instable to acids, a compound generating an acid on active ray irradiation, and specific benzotriazole compound(s).
CONSTITUTION: The objective composition comprising (A) as a compound having group instable to acids, a polymeric compound containing t-amyloxycarbonyl group, prepared by radical copolymerization between methacrylic acid, t-amyl methacrylate and n-butyl acrylate, (B) a compound generating an acid on active ray irradiation (e.g. p-nitrobenzyl-9,10-diethoxyanthracene-2-sulfonate), and (C) benzotriazole derivative(s) of formula I (R1 is H, halogen, OH, alkyl or alkoxy; R2 us H, OH, alkyl, ester, phenyl, etc.; n is 1-3) and/or formula II (R4 is H, alkyl or phenyl).
TACHIKI SHIGEO
AKAHORI SATOHIKO
