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Title:
POSITIVE TYPE PHOTOSENSITIVE COMPOSITION
Document Type and Number:
Japanese Patent JP2002023353
Kind Code:
A
Abstract:

To solve the problems of a performance enhancing technique proper to microphotofabrication using far ultraviolet light, particularly ArF excimer laser light and to provide a positive type photosensitive composition excellent also in sensitivity, resolving power and margin for exposure.

The positive type photosensitive composition contains a compound which generates an acid when irradiated with active light or radiation and a resin having a specified alicyclic hydrocarbon structure and having solubility in an alkali developing solution increased when the resin is decomposed by the action of the acid.


Inventors:
KODAMA KUNIHIKO
AOSO TOSHIAKI
Application Number:
JP2000000212946
Publication Date:
January 23, 2002
Filing Date:
July 13, 2000
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/004; C08K5/00; C08K5/16; C08K5/42; C08L101/02; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; C08K5/00; C08K5/16; C08K5/42; C08L101/02; G03F7/039; H01L21/027
Domestic Patent References:
JP2000047387A2000-02-18
JP2000122296A2000-04-28
JPH07140666A1995-06-02
JPH03206458A1991-09-09
JPH11167200A1999-06-22
JP2000080124A2000-03-21
JP2000137327A2000-05-16
JP2000128930A2000-05-09
JP2000187330A2000-07-04
JP2000112120A2000-04-21
JPH11338148A1999-12-10
JPH11282166A1999-10-15
Attorney, Agent or Firm:
Shohei Oguri (4 outside)