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Title:
POSITIVE TYPE RESIST COMPOSITION AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP3739251
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To provide a positive type resist composition used for laser light in the vacuum ultraviolet region as a positive type resist composition containing a base resin having solubility in an alkaline aqueous solution varied by the action of an acid and an acid generating agent.
SOLUTION: A copolymer containing a unit of formula (1) as a constituent unit is used as the base resin.


Inventors:
Otani, Mitsutaka
Tsutsumi, Kentaro
Maeda, Kazuhiko
Application Number:
JP2000000149968
Publication Date:
January 25, 2006
Filing Date:
May 22, 2000
Export Citation:
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Assignee:
CENTRAL GLASS CO LTD
International Classes:
G03F7/039; C08F2/46; C08F216/14; C08F218/04; C08F220/10; C08F226/02; C08F232/04; C08K5/00; C08L27/12; H01L21/027; (IPC1-7): G03F7/039; C08F2/46; C08F216/14; C08F218/04; C08F220/10; C08F226/02; C08F232/04; C08K5/00; C08L27/12; H01L21/027
Domestic Patent References:
JP2000089462A
JP11130844A
JP10254140A
JP9244247A
JP2000109545A
JP2000098614A
JP11194496A
JP11184090A
JP11160877A
Attorney, Agent or Firm:
西 義之