POSITIVE TYPE RESIST COMPOSITION AND PATTERNING METHOD

Title:

POSITIVE TYPE RESIST COMPOSITION AND PATTERNING METHOD

Document Type and Number:

Japanese Patent JP2002196494

Kind Code:

A

Abstract:

To provide a positive type resist composition which is excellent in sensitivity, dry etching resistance, heat resistance, and has an analog characteristic of varying processing depths on exposure amount, and to provide a pattering method using the same.

The positive type resist composition (I) comprises (A) a vinyl copolymer containing an alkoxysilane group and (C) a curing catalyst. The positive type resist composition (II) comprises (A) a vinyl copolymer containing an alkoxysilane group, (B) a hydrolytic alkoxysilane or its low condensate, and (C) a curing catalyst. The patterning method uses the positive type resist composition (I) or the positive type resist composition (II).

More Like This:

JP6764672	Method for manufacturing resist composition and resist pattern
JP6287499	Method for producing polymerizable monomer, resin, resist composition and resist pattern
WO/2004/014960	FLUORINATED MONOMERS, FLUORINATED POLYMERS HAVING POLYCYCLIC GROUPS WITH FUSED 4-MEMBERED HETEROCYCLIC RINGS, USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY

Inventors:

INOUE HIROSHI
MATSUKAWA KOYO
TAMAI SATOYUKI
MATSUURA YUKITO
HAMAMOTO TETSUYA
TOYODA HIROSHI

Application Number:

JP2000396890A

Publication Date:

July 12, 2002

Filing Date:

December 27, 2000

Export Citation:

Click for automatic bibliography generation Help

Assignee:

JAPAN SCIENCE & TECH CORP
INOUE HIROSHI
MATSUKAWA KOYO
TAMAI SATOYUKI
MATSUURA YUKITO

International Classes:

G03F7/039; C08F230/08; C08K3/00; C08K5/00; C08L43/04; G03F7/075; H01L21/027; (IPC1-7): G03F7/039; C08F230/08; C08K3/00; C08K5/00; C08L43/04; G03F7/075

Attorney, Agent or Firm:

Eiji Saegusa

Previous Patent: METHOD OF MANUFACTURING SHADOW MASK AND LEAD FRAME

Next Patent: CHEMICAL AMPLIFICATION TYPE POSITIVE TYPE RESIST COMPOSITION FOR THERMAL FLOW AND PATTERN FORMING ME...