POSITIVE TYPE RESIST COMPOSITION

Title:

POSITIVE TYPE RESIST COMPOSITION

Document Type and Number:

Japanese Patent JPH07301914

Kind Code:

A

Abstract:

PURPOSE: To obtain a resist compsn. of positive type excellent in balance of various characteristics such as sensitivity, the rate of a residual film and resolution by incorporating a specified polyhydroxy compd.

CONSTITUTION: A polyhydroxy compd. represented by formula I or II is incorporated into a positive type resist compsn. contg. alkalisoluble phenolic resin and a quinonediazidosulfonic ester type photosensitive agent in place of the alkali-soluble phenolic resin or in combination with the phenolic resin. In the formula I, each of R1-R12 is H, halogen, hydroxyl, 1-4C alkyl, 2-5C alkenyl, 6-15C aryl or 1-6C alkoxy. In the formula II, each of R22-R33 is H, halogen, hydroxyl, 1-4C alkyl, 2-5C alkenyl, 6-15C aryl or 1-6C alkoxy.

More Like This:

JP4209297	Discharge Nozzle Type Positive Photoresist Composition for Coating Method and Method for Forming Resist Pattern
JP3485484	PHOTOSENSITIVE POLYBENZO OXAZOL RESIN MULTIPLE ORGANIC FILM AND FORMING METHOD OF RELIEF PATTERN
JPS6446746	POSITIVE TYPE PHOTORESIST COMPOSITION

Inventors:

KAWADA MASAJI
KATOU TAKEYOSHI
AZUMA HIROKAZU

Application Number:

JP11450894A

Publication Date:

November 14, 1995

Filing Date:

April 28, 1994

Export Citation:

Click for automatic bibliography generation Help

Assignee:

NIPPON ZEON CO

International Classes:

G03F7/022; G03F7/004; H01L21/027; (IPC1-7): G03F7/022; H01L21/027

Attorney, Agent or Firm:

Nishikawa Shigeaki

Previous Patent: Electrical connector with recordable position assurance

Next Patent: Chimeric antigen receptor targeting B cell maturation antigen