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Title:
POSITIVE-WORKING RESIST COMPOSITION AND METHOD FOR PATTERN FORMATION USING THE SAME
Document Type and Number:
Japanese Patent JP2009042748
Kind Code:
A
Abstract:

To provide a positive-working resist composition which has high sensitivity and satisfies both of pattern falling and variation in line width, and a method for pattern formation.

The positive-working resist composition uses a resin having a specific structure containing an acid decomposable group in its polymer main chain and having repeating units containing a plurality of specific acid decomposable groups. The method for pattern formation is also provided.


Inventors:
Kato, Takayuki
Shibuya, Akinori
Iizuka, Yusuke
Application Number:
JP2008000180797
Publication Date:
February 26, 2009
Filing Date:
July 10, 2008
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
G03F7/039; C08F2/38; C08F220/02; C08F232/06; H01L21/027
Domestic Patent References:
JP2006091762A2006-04-06
JP2006249225A2006-09-21
JP2004334156A2004-11-25
JPH11119434A1999-04-30
Foreign References:
WO2005085301A12005-09-15
Attorney, Agent or Firm:
高松 猛
矢澤 清純