Title:
粉末冶金スパッタリングターゲット及びその製造方法
Document Type and Number:
Japanese Patent JP5006030
Kind Code:
B2
Abstract:
A method of forming a sputtering target and other metal articles having controlled oxygen and nitrogen content levels and the articles so formed are described. The method includes surface-nitriding a deoxidized metal powder and further includes consolidating the powder by a powder metallurgy technique. Preferred metal powders include, but are not limited to, valve metals, including tantalum, niobium, and alloys thereof.
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| WO/2016/026847 | METHOD FOR PREPARING ACTIVE PALLADIUM(0) POWDER |
Inventors:
Mikark, Christopher A.
Yuan, Shi
Maguire, James Dee.
Yuan, Shi
Maguire, James Dee.
Application Number:
JP2006500812A
Publication Date:
August 22, 2012
Filing Date:
January 07, 2004
Export Citation:
Assignee:
CABOT CORPORATION
International Classes:
B22F1/145; B22F3/15; B22F3/20; B22F5/00; C22C27/02; C23C8/02; C23C8/80; C23C14/34; H01G9/052; H01L21/285
Domestic Patent References:
| JP336229A | ||||
| JP2000323432A |
Attorney, Agent or Firm:
Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Yoshihiro Kobayashi
Satoshi Deno
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Yoshihiro Kobayashi
Satoshi Deno