To provide a preliminary drying device and method, and a substrate treating system, suppressing occurrence of unevenness on a coated film, and shortening a tact time required for a drying process.
The preliminary drying device for preliminarily drying the coated film before drying the coated film by a main drying device for drying the coated film coated on a substrate has a heating and drying chamber communicated with a carrying-in part and a carrying-out part and formed in the high temperature atmosphere, and the substrate carried from the carrying-in part is made to pass through the heating and drying chamber by the carrying-out part, and thereby, the substrate is exposed to the high temperature atmosphere in the heating and drying chamber, and the coated film on the substrate is preliminarily dried.
OKUDA DAISUKE