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Title:
PREPARATION OF ANTISTATIC MOLDED SYNTHETIC RESIN ARTICLE
Document Type and Number:
Japanese Patent JPS5884826
Kind Code:
A
Abstract:

PURPOSE: To obtain the titled molded article having improved durability without changing the bulk characteristics, by forming a crosslinked layer on the surface layer of a molded synthetic resin article, and laminating a film obtained by the plasmatic polymerization at a low temperature plasma treatment of a specific silicon compound on the crosslinked layer.

CONSTITUTION: A crosslinked layer preferably of ≥20 thickness is formed on the surface layer of a molded synthetic resin article by the irradiation with ultraviolet light, etc., and a film of ≥50 thickness obtained by the plasmatic polymerization of a silicon compound (hydrolytic condensate) of the formula[R is monofunctional hydrocarbon group; X is halogen or alkyl; (a) is 1,2 or 3; (b) is 0 or 1; (a+b) is 0,1,2 or 3], e.g. trimethylchlorosilane, is laminated on the resultant crosslinked layer to give the aimed molded article. The plasmatic treatment is preferably carried out at 1W0.005Torr gas pressure.


Inventors:
ASAI MICHIHIKO
SHIMURA YUKIO
TSUDA KEISHIROU
UENO SUSUMU
NOMURA HIROKAZU
IMADA KIYOSHI
Application Number:
JP18334681A
Publication Date:
May 21, 1983
Filing Date:
November 16, 1981
Export Citation:
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Assignee:
KOGYO GIJUTSUIN
SHINETSU CHEM IND CO
International Classes:
C08J7/00; B05D3/06; B05D7/26; B29C71/04; C08J7/04; C08J7/12; C08J7/18; C08K5/54; C08L25/04; C08L77/00; (IPC1-7): C08J7/04; C08J7/10
Domestic Patent References:
JPS5749627A1982-03-23
Attorney, Agent or Firm:
Ryoichi Yamamoto