PREPARATION OF IMPACT-RESISTANT RESIN COMPOSITION

Japanese Patent JP3158901

B2

PURPOSE: To prepare an impact-resistant resin compsn. which can reduce the necessity of waste water treatment and has excellent color tone and mechanical strengths by continuously adding and mixing a particular graft copolymer to a copolymer, in a melted state, prepd. by continuous bulk polymn. of a predetermined monomer mixture.
CONSTITUTION: 90 to 5 pts.wt. (hereinafter referred to as 'pts.') graft copolymer prepd. by graft-polymerizing 95 to 20 pts. mixture of 10 to 100wt.% (hereinafter referred to as '%') arom. vinyl monomer (A), 0 to 50% of vinyl cyanide monomer (B), and 0 to 80% (meth)acrylic ester monomer (C), and (D) 0 to 60% other copolymerizable vinyl monomer(s) in the presence of 5 to 80 pts. rubber-like polymer and feeding a slurry or a water-contg. cake prepd. from the resultant latex into an extruder provided with a groove, a hole, or a gap and a vent hole for passing a liquid material therethrough, thereby conducting dehydrating and drying, is continuously added to and mixed with 10 to 95 pts. copolymer, in a melted state, in the course of continuous bulk polymerization of a mixture of 20 to 100% component (A), 0 to 60% component (B), 0 to 80% component (C), and 0 to 60% component (D).

Akihiko Kishimoto
Goto Eizo
Akira Kadoi
Keiji Nakagawa

JP27324594A

April 23, 2001

November 08, 1994

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Toray Industries, Inc.

C08J3/20; C08F6/26; C08L25/02; C08L25/12; C08L51/04; C08L55/00; C08L55/02; (IPC1-7): C08J3/20; C08L25/02; C08L51/04; C08L55/02

JP48754A
JP5749603A
JP7292205A

【文献】佐伯康治,尾見信三編著,「新ポリマー製造プロセス」,初版,(株)工業調査会,1994年6月10日

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