PURPOSE: To perform the positioning between the second electrode, the third electrode and the second dielectric with high accuracy, by forming a structure having the second and third electrodes and the second dielectric before forming the first dielectric and the first electrode on the second electrode.
CONSTITUTION: A photosensitive resist film for the second dielectric is laminated to the third electrode made of a stainless steel sheet having openings 27 formed thereto by etching. A mask is adapted to said resist film, and the openings 27 and parts other than drawn-up parts are exposed to ultraviolet rays. Next, a stainless steel sheet is laminated to the resist film by an adhesive to form the second electrode 12 and openings 16 are formed with a developer. Subsequently, a photosensitive resist film is laminated to the second electrode 12, and only the parts between the adjacent second electrodes 12 are exposed to ultraviolet rays and unexposed parts are subsequently removed by development. The bonded body of the first electrode 11 and the first dielectric 14 is formed by the same method and the first dielectric 14 is adhered to the second electrode 12. By this method, the positioning of the second dielectric and the second/third electrodes exerting effect on image qualify can be performed with high accuracy.
WATANABE NOBUO
SHIMIZU TETSUYA
MIYAJI GOJI
NAGASE YUKIO
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