Title:
PREPARATION OF LIGHT WAVELENGTH CHANGING ELEMENT
Document Type and Number:
Japanese Patent JPH0279821
Kind Code:
A
Abstract:
PURPOSE:To prevent decrease of efficiency for changing wavelength and efficiency for coupling an input of fundamental waves by exposing a surface of an org. nonlinear optical material to plasma gas of N2, He, Ne, Ar, Kr, or Xe. CONSTITUTION:A light wavelength changing element 10 is obtd. by exposing both end faces of a glass fiber 12' which has been filled in a core 11 comprising an org. nonlinear optical material and cut appropriately at the both end faces, to N2 plasma 21 generated from a plasma generating apparatus 20 using a high frequency source 22. By treating the surface of the org. nonlinear optical material with plasma as described above, sublimation or degeneration of the org. nonlinear optical material is prevented securely. Thus, decrease of an efficiency for changing wavelength of the org. nonlinear optical material is prevented, preventing also decrease of an efficiency for coupling an input of fundamental waves.
Inventors:
KATO TAKAYUKI
Application Number:
JP23184788A
Publication Date:
March 20, 1990
Filing Date:
September 16, 1988
Export Citation:
Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G02F1/35; G02F1/355; G02F1/361; G02F1/37; H01S3/109; (IPC1-7): G02F1/35; G02F1/37; H01S3/109
Attorney, Agent or Firm:
Seiji Yanagida (1 person outside)
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