To provide a high-quality display panel such as an organic EL element and a liquid crystal element by preventing direct contact of reactive gas or mist G generated from an etching solution L with an exposed conductive film and precisely patterning the conductive film.
When patterning is carried out on a resist film R laminated on a substrate M, the conductive film of the lower layer is exposed. The exposed conductive film is covered with a protective liquid film F until the processing reaches an etching processing to block off the conductive film from the atmosphere containing the reactive gas or mist G flowing out of an etching chamber 20. By removing the protective liquid film F from the substrate M just before etching and carrying out patterning on the conductive film, a precise electrode pattern is formed under stable etching conditions.
KITAJIMA TAKAYUKI
KOMADA MASANORI
SAITO YUTAKA
NAKAJIMA SHINJI
Okada Manri
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