PRESSURE ADJUSTING DEVICE FOR REFRIGERANT CIRCUIT

Japanese Patent JP2953849

B2

PURPOSE: To prevent an impure gas from mixing in by a method wherein first and second pressure adjusting valves, of which the inside is divided by a diaphragm into a pressure chamber to introduce the low pressure side pressure of a compressing means, and a pressure chamber in which an working medium is sealed and held at the atmospheric pressure, are connected to the compressing means in parallel, together with an intermediate pressure tank, for a pressure adjusting device for a refrigerating device, etc.
CONSTITUTION: An intermediate pressure tank 25 and first and second pressure adjusting valves 26, 27 are arranged in parallel with a compressor 12. For the pressure adjusting valve 26 (the second pressure adjusting valve 27 has the same constitution), the internal space is divided into a first pressure chamber 31 and second pressure chamber 32 by a diaphragm 30. The first pressure chamber 31 communicates with the low pressure side of the compressor 12 by a low pressure port 31a. To the second pressure chamber 32, an expansion member 41, in which the same working medium as the actuating medium in a refrigerant circuit 11 is encapsulated and held at the atmospheric pressure, is fixed by a port 32a. To the diaphragm 30, a valve rod 33 is fitted to control the communication of chambers 36 an 37 of a cylinder part 28a.

JP3476839	[Title of Invention] Joule-Thomson Cryostat In-line Valve Flow Control Device
JP2021127885	CRYOGENIC SYSTEM

HIRANO AKIRA
INOE TATSUO
TERAI MOTOAKI

JP1544392A

September 27, 1999

January 30, 1992

Click for automatic bibliography generation  

AISHIN SEIKI KK
TOKAI RYOKAKU TETSUDO KK
MITSUBISHI DENKI KK

F25B9/02; F16K17/04; F25B9/00; F25B41/04; (IPC1-7): F25B9/00; F16K17/04; F25B9/02; F25B41/04

JP6332267U

Previous Patent: ANNIHILATION PROCESSING REACTOR CORE FOR TRANSURANIUM ELEMENT

Next Patent: CRACK DETECTOR OF SEMICONDUCTOR SUBSTRATE