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Patent Searching and Data


Title:
PRETREATMENT METHOD AND PRETREATMENT APPARATUS FOR METAL ANALYSIS
Document Type and Number:
Japanese Patent JP2010156619
Kind Code:
A
Abstract:

To provide a pretreatment method for metal analysis, measuring a metal concentration more easily, safely and accurately without any interruption of a metal analysis by a silicon component.

A pretreatment apparatus for metal analysis 1 and the pretreatment method using the same has: a pH adjustment means 2 for adding acid to an alkali solution sampled from an alkali solution tank 50 housing the alkali solution containing the silicon component; a solid phase extraction means 3 capable of bringing a solution pH-adjusted by the pH adjustment means 2 into contact with a chelate resin or a chelate fiber to eliminate a metal from the solution; an alkali cleaning means 4 for supplying an alkali cleaning liquid to the solid phase extraction means 3, which has captured the metal, to clean the chelate resin or the chelate fiber; and a metal eluting means 5 for supplying an eluting agent to the alkali-cleaned chelate resin or chelate fiber to elute the metal from the solid phase.

COPYRIGHT: (C)2010,JPO&INPIT


Inventors:
IIYAMA MASAMITSU
KOSAKA KENGO
Application Number:
JP2008335316A
Publication Date:
July 15, 2010
Filing Date:
December 26, 2008
Export Citation:
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Assignee:
NOMURA MICRO SCIENCE KK
International Classes:
G01N1/10; B01D15/00; B01J45/00; B01J49/00; C02F1/28; C02F1/42; C02F1/44
Attorney, Agent or Firm:
Saichi Suyama
Yukio Kawahara
Satoshi Yamashita
Hideaki Suyama