Title:
PRINTABLE ETCHING MEDIA FOR SILICON DIOXIDE LAYER AND SILICON NITRIDE LAYER
Document Type and Number:
Japanese Patent JP2015083682
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide: novel printable etching medium having non-Newtonian flow behavior for the etching of surfaces in the production of solar cells; a method for using the same; and an etching and doping composition which is suitable both for the etching of inorganic layers and also for the doping of underlying layers.SOLUTION: This invention relates to, in a printable composition in the form of paste for the etching of the extremely-fine line or structure of glass-like or crystalline layers, the use of: finely particulate inorganic powder in the form of finely particulate graphite and/or carbon black; and/or a finely particulate organic powder in the form of a finely particulate plastic powder selected from the group of polystyrenes, polyacrylates, polyamides, polyimides, polymethacrylates, melamine resin, urethane resin, benzoguanine resin, phenolic resin, silicone resins, micronised cellulose, and fluorinated polymers (PTFE, PVDF).
Inventors:
STOCKUM WERNER
ARMIN KUEBELBECK
NAKANOWATARI JUN
ARMIN KUEBELBECK
NAKANOWATARI JUN
Application Number:
JP2014231134A
Publication Date:
April 30, 2015
Filing Date:
November 13, 2014
Export Citation:
Assignee:
MERCK PATENT GMBH
International Classes:
C09K13/00; H01L31/068; H01L31/18
Attorney, Agent or Firm:
Kiyoji Kuzuwa