Title:
二酸化ケイ素層および窒化ケイ素層のためのプリント可能なエッチング媒体
Document Type and Number:
Japanese Patent JP5698897
Kind Code:
B2
Abstract:
The present invention relates to a novel printable etching medium having non-Newtonian flow behavior for the etching of surfaces in the production of solar cells, and to the use thereof. The present invention furthermore also relates to etching and doping media which are suitable both for the etching of inorganic layers and also for the doping of underlying layers. In particular, they are corresponding particle-containing compositions by means of which extremely fine structures can be etched very selectively without damaging or attacking adjacent areas.
Inventors:
Stockum, Werner
Kubelbeck, Armin
Nakano Watanabe
Kubelbeck, Armin
Nakano Watanabe
Application Number:
JP2008520738A
Publication Date:
April 08, 2015
Filing Date:
June 21, 2006
Export Citation:
Assignee:
Merck Patent Gesellschaft mit beschraenkter Haftung
International Classes:
C09K13/00; H01L21/306
Domestic Patent References:
| JP5107722B2 | ||||
| JP4837285B2 | ||||
| JP2003531807A | ||||
| JP2005506705A | ||||
| JP1147078A | ||||
| JP3173318B2 |
Attorney, Agent or Firm:
Kiyoji Kuzuwa
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