Title:
PROCESS CHAMBER DOOR OPEN/CLOSE DEVICE OF BAKING EQUIPMENT FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP3183855
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To suppress contamination of wafer and surrounding environment to minimum, by automatically opening/closing a door, for improved work efficiency and also for suppressing occurrence of fine particles at door's opening/ closing operation to minimum.
SOLUTION: In the care of opening, for example, from the state where an entrance is closed with a door 31, an operator operates a door opening switch 29 to drive a gear deceleration motor 27. Then, a rotation shaft 24 is rotated, and the door 31 is interlocked to the rotation axis 24, connected with fixing bars 32 and 33, thus the door 31 automatically opens the entrance. At the same time, a head part 37 is interlocked with the rotation shaft 24 to rotate. When the second projection of the head part 37 reaches the position of second button of a limit switch 36 to press the second button, the gear deceleration motor 27 is stopped and the door 31 stops at an open position after rotation by specified angle. Thus, opening/closing operation for the entrance is automatically done, and the rotation shaft 24 is rotation-supported with bearings 25 and 26, so work efficiency is improved.
Inventors:
Forever
Choi Yu
Choi Yu
Application Number:
JP30028297A
Publication Date:
July 09, 2001
Filing Date:
October 31, 1997
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
H01L21/677; F27B17/02; F27D1/18; H01L21/027; H01L21/30; H01L21/306; H01L21/324; (IPC1-7): H01L21/68; F27D1/18
Domestic Patent References:
| JP455686A | ||||
| JP56934A |
Attorney, Agent or Firm:
Hidekazu Miyoshi (1 outside)