PROCESS AND COMPOSITION WHICH STABILIZE CYCLOTETRASILOXANE FOR POLYMERIZATION

Title:

PROCESS AND COMPOSITION WHICH STABILIZE CYCLOTETRASILOXANE FOR POLYMERIZATION

Document Type and Number:

Japanese Patent JP2010065039

Kind Code:

A

Abstract:

To provide a process and a composition for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization.

The process for stabilization comprises providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane. The composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material production, comprises: such cyclotetrasiloxane; and a free radical scavenger polymerization inhibitor.

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Inventors:

MAYORGA STEVEN GERARD
XIAO MANCHAO
GAFFNEY THOMAS RICHARD
SYVRET ROBERT GEORGE

Application Number:

JP2009235563A

Publication Date:

March 25, 2010

Filing Date:

October 09, 2009

Export Citation:

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Assignee:

AIR PROD & CHEM

International Classes:

C07F7/21; C01B33/113; C07F7/20; C08G77/04; C08G77/38; C09D4/00; C23C16/40; C23C16/42; H01L21/316; C08K5/13

Domestic Patent References:

JPH07145179A	1995-06-06
JPH04128293A	1992-04-28

Attorney, Agent or Firm:

Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Nagasaka Tomoyasu
Yoshihiro Kobayashi
Atsushi Ebiya

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