Title:
PROCESS LIQUID FOR SILICEOUS FILM FORMATION
Document Type and Number:
Japanese Patent JP2016030777
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a novel process liquid and processing method that can impart excellent rust-prevention performance and excellent lubricity to a wide range of metal materials.SOLUTION: The present invention provides a process liquid for siliceous film formation that comprises solution comprising alkoxysilane oligomer, colloidal silica and lubricant, and a siliceous film forming method characterized in that the process liquid is applied on a processed object before hardening it.SELECTED DRAWING: None
Inventors:
SHIMAHASHI KATSUMASA
KATO TAKASHI
MURAHASHI KOICHIRO
OTSUKA KUNIAKI
KATO TAKASHI
MURAHASHI KOICHIRO
OTSUKA KUNIAKI
Application Number:
JP2014152941A
Publication Date:
March 07, 2016
Filing Date:
July 28, 2014
Export Citation:
Assignee:
OKUNO CHEM IND CO
International Classes:
C09D183/04; B05D7/24; C09D1/00; C09D5/00; C09D7/12; C10M103/00; C10M105/76; C10M125/26; C10M139/04; C10M155/02; C10M159/06; C23C22/53
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Foreign References:
| WO2010070728A1 | 2010-06-24 |
Attorney, Agent or Firm:
Patent Business Corporation Saegusa International Patent Office
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