To provide supply of process liquid at constant pressure or constant flow rate while keeping secondary pressure of secondary flow rate of a constant pressure valve constant without increasing delivery pressure of a pump higher than necessary one.
In a process liquid supply system provided with: a process liquid tank 3 storing process liquid; a bellows pump 4 continuously delivering process liquid from the process liquid tank 3 to piping 2 connecting to a process liquid supply nozzle 36 supplying process liquid; and the constant pressure valve 5 positioned on a secondary side of the bellows pump 4 and inhibiting pulsation of liquid flow by the bellows pump 4, a gas supply source 7 supplying gas compensating pressure drop of pulsation of liquid flow by the bellows pump 4 is connected to the secondary side of the bellows pump 4 in the piping 2, and a filter 8 including a gas release part 8a discharging gas supplied in the piping 2 from the gas supply source 7 is provided.
TANAKA TAKASHI
IWASHITA MITSUAKI
TOSHIMA TAKAYUKI
ORII TAKEHIKO
| JP3561438B2 | 2004-09-02 | |||
| JP2005313266A | 2005-11-10 | |||
| JP2004011595A | 2004-01-15 |
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