Title:
PROCESS FOR MASK ALIGNMENT
Document Type and Number:
Japanese Patent JPS5228269
Kind Code:
A
Abstract:
PURPOSE:To observe rough surface and to make it possible to do accurae adjustment of mask by using Nomarsky differential interfermeter.
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Inventors:
SASAKI TOSHINORI
YOSHIDA KIYOSHI
YOSHIDA KIYOSHI
Application Number:
JP10398575A
Publication Date:
March 03, 1977
Filing Date:
August 29, 1975
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/027; H01L21/302; (IPC1-7): H01L21/302
Domestic Patent References:
| JPS4928363A | 1974-03-13 |