Title:
2以上の計測された散乱計測信号間の比較によるプロセス最適化および制御の方法
Document Type and Number:
Japanese Patent JP4799402
Kind Code:
B2
Abstract:
A method for determining one or more process parameter settings of a photolithographic system is disclosed.
Inventors:
Meeher Walter Di.
Mac Chris
Hankinson Matt
Mac Chris
Hankinson Matt
Application Number:
JP2006501078A
Publication Date:
October 26, 2011
Filing Date:
January 20, 2004
Export Citation:
Assignee:
KLA-Tenker Corporation
International Classes:
H01L21/027; G01B11/00; G01B11/14; G01B11/28; G03C5/00; G03F7/20; G03F9/00; G03F
Domestic Patent References:
| JP2004508559A | 2004-03-18 | |||
| JP2004510152A | 2004-04-02 | |||
| JP2004529330A | 2004-09-24 | |||
| JPH0289305A | 1990-03-29 | |||
| JP2002231604A | 2002-08-16 | |||
| JP2002311564A | 2002-10-23 |
Foreign References:
| WO2002021075A1 | 2002-03-14 | |||
| WO2002027288A1 | 2002-04-04 | |||
| WO2002070985A1 | 2002-09-12 |
Attorney, Agent or Firm:
Meisei International Patent Office