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Patent Searching and Data


Title:
PROCESS FOR PRODUCING ACRYLIC ACID
Document Type and Number:
Japanese Patent JP2001199931
Kind Code:
A
Abstract:

To provide a process for producing acrylic acid in high yield and purity.

The objective process for the production of acrylic acid contains (a) a step to perform the catalytic vapor-phase oxidation of propylene and/or acrolein with a gas containing molecular oxygen, (b) a step to introduce the obtained mixed gas into an acrylic acid collection column and bring to contact with a solvent to collect the oxidation product as an acrylic acid solution, (c) a step to distil the acrylic acid solution and separate a crude acrylic acid essentially free from solvent as a column bottom flow and/or column side flow, (d) a step to supply the crude acrylic acid to crystallization step and separate into purified acrylic acid and residual liquor by melt crystallization and (e) a step to supply the residual liquor to an acrylic acid dimer decomposition step and supply the obtained distilled liquid to one or more steps selected from the crystallization step, the distillation step and the collection step.


Inventors:
UENO KOJI
KAMIOKA MASATOSHI
NAKAHARA HITOSHI
Application Number:
JP2000000007057
Publication Date:
July 24, 2001
Filing Date:
January 14, 2000
Export Citation:
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Assignee:
NIPPON CATALYTIC CHEM IND
International Classes:
C07C51/235; C07C51/25; C07C51/347; C07C51/43; C07C51/46; C07C57/04; C07C57/07; (IPC1-7): C07C51/25; C07C51/235; C07C51/347; C07C51/43; C07C51/46; C07C57/04; C07C57/07
Attorney, Agent or Firm:
八田 幹雄 (外3名)