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Title:
PROCESS FOR PRODUCING MONOMER FOR FLUORINATED RESIST
Document Type and Number:
Japanese Patent JP2010275298
Kind Code:
A
Abstract:

To provide a process for producing an α-substituted acrylic ester-based monomer for fluorine-containing resists on a commercial scale, wherein, in the production of an ester-based monomer for fluorine-containing resists by directly adding α-substituted acrylic acid to a fluoroalkene in the presence of an (specific) acid catalyst, although isomerization of the alkene, generation of a diol, and excessive addition reaction proceed as side reactions, the objective reaction is caused to proceed efficiently.

An α-substituted acrylic acid is caused to directly add to a fluoroalkene in the presence of a specific acid catalyst having a sulfonyl group. The objective monomer for fluorinated resists is efficiently produced from α-substituted acrylic acid by one step reaction on an industrial scale.


Inventors:
AKIBA SHINYA
NADANO AKIRA
KATSUHARA YUTAKA
Application Number:
JP2010099313A
Publication Date:
December 09, 2010
Filing Date:
April 23, 2010
Export Citation:
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Assignee:
CENTRAL GLASS CO LTD
International Classes:
C07C67/04; C07C69/65; C07B61/00
Domestic Patent References:
JP2005239710A2005-09-08
JP2005206587A2005-08-04
JP2001518393A2001-10-16
JP2009503038A2009-01-29
JP2009051805A2009-03-12
JPH02295951A1990-12-06
JP2004046098A2004-02-12
JP2004175740A2004-06-24
JP2007091634A2007-04-12
JP2005521748A2005-07-21
JP2000063323A2000-02-29
JP2004250386A2004-09-09
JP2005060337A2005-03-10
JP2005511777A2005-04-28
JP2007533653A2007-11-22
JP2005239710A2005-09-08
JP2005206587A2005-08-04
JP2001518393A2001-10-16
JP2009503038A2009-01-29
JP2009051805A2009-03-12
JPH02295951A1990-12-06
Attorney, Agent or Firm:
Makoto Koide



 
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