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Title:
PROCESS FOR REMOVING RESIDUAL MONOMER FROM GRANULAR VINYL CHLORIDE PASTE RESIN
Document Type and Number:
Japanese Patent JPH11147911
Kind Code:
A
Abstract:

To remove a residual monomer from a granular vinyl chloride paste resin without detriment to the quality of the resin by bringing the paste resin into further contact with an air stream in a specified temperature range.

A granular vinyl chloride paste resin obtained by drying a polymer latex produced from a monomer mixture based on a vinyl chloride monomer is brought into further contact with an air stream at 20-60°C. The size of the granular vinyl chloride paste resin is desirably such that the mean article diameter is 30-100 μm, further 30-80 μm, particularly 30-70μm. By bringing the granular paste resin into contact with an air stream at 20-60°C, desirably 30-50°C its residual monomer content can be decreased to, desirably, 5 ppm or below, more desirably, 1 ppm or below. Although the time of contact with the air stream may vary with various conditions, it is usually about 10 to 360 min. The contacting system adopted is, for example, a fluidized bed system which may be batchwisc or continuous.


Inventors:
YOSHIDA TAKESHI
Application Number:
JP31683797A
Publication Date:
June 02, 1999
Filing Date:
November 18, 1997
Export Citation:
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Assignee:
KANEGAFUCHI CHEMICAL IND
International Classes:
C08J3/12; C08F6/00; C08F14/06; (IPC1-7): C08F6/00; C08J3/12
Attorney, Agent or Firm:
Sota Asahina (1 person outside)