Title:
PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2023155947
Kind Code:
A
Abstract:
To provide a processing apparatus which has a simple structure and can prevent processing water from being scattered to the outside of a processing chamber.SOLUTION: A processing chamber cover of a processing apparatus is provided with a first transverse part extending from a position between a first side plate and a first delivery port defined in the first side plate to the outside of a first processing chamber. Thus, in the processing apparatus, a width of a gap between the transverse part and a pedestal positioned in the delivery port when a workpiece is processed in the processing chamber, i.e., a length of the gap along a direction toward the outside of the processing chamber, is large. In this case, when processing water that is scattered passes through the gap, the processing water will likely contact the pedestal or the transverse part and stay in the gap. As a result, in the processing apparatus, the processing water is effectively prevented from being scattered to the outside of the processing chamber by a simple structure, compared to a case where water supply means for forming a water film is provided in the gap.SELECTED DRAWING: Figure 3
Inventors:
YAMANAKA SATOSHI
Application Number:
JP2022065474A
Publication Date:
October 24, 2023
Filing Date:
April 12, 2022
Export Citation:
Assignee:
DISCO ABRASIVE SYSTEMS LTD
International Classes:
B24B55/06; B23Q11/08; B24B7/00; B24B55/02; H01L21/304
Attorney, Agent or Firm:
Akira Matsumoto
Tomohiro Okamoto
Takahiro Kasahara
Hideaki Okamoto
Takayuki Okano
Toshikazu Imato
Tomohiro Okamoto
Takahiro Kasahara
Hideaki Okamoto
Takayuki Okano
Toshikazu Imato