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Patent Searching and Data


Title:
PROCESSING DEVICE AND METHOD OF MAINTAINING THE DEVICE
Document Type and Number:
Japanese Patent JP2003303023
Kind Code:
A
Abstract:

To confirm operation of a flow control part such as a mass flow controller (MFC) controlling the flow of the liquid source without separating the flow control part from a liquid source feed passage in a film processing device using vaporized liquid source.

The operation of an MFC is confirmed by bypassing a part of a washing fluid feed passage for washing a liquid source feed passage, setting a flowmeter for calibration in the bypass passage, and feeding washing fluid to the flowmeter and the MFC. The flowmeter does not scale out even though the flow rate of liquid source at film processing time is small, for instance approx. 1/10 of the flow rate of the washing liquid at washing time by preventing the washing liquid to flow in the bypass passage at washing time. As another method, a relationship between a signal corresponding to an established flow rate of the MFC and a signal corresponding to the opening of a valve of the MFC is stored in advance and the comparison of this data with the data at calibration time may fulfill the object.


Inventors:
Toriya, Daisuke
Honma, Kenji
Tsukada, Akihiko
Shimomura, Koji
Application Number:
JP2002000279181
Publication Date:
October 24, 2003
Filing Date:
September 25, 2002
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
G01F1/00; C23C16/44; C23C16/448; G01F25/00; G05D7/06; H01L21/304; H01L21/31; G01F1/00; C23C16/44; C23C16/448; G01F25/00; G05D7/06; H01L21/02; (IPC1-7): G05D7/06; G01F1/00; G01F25/00; H01L21/304; H01L21/31