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Patent Searching and Data


Title:
PROCESSING SYSTEM AND FLOW MEASUREMENT METHOD
Document Type and Number:
Japanese Patent JP2004003957
Kind Code:
A
Abstract:

To provide a processing system capable of measuring an actual gas flow rate in a flow controller properly without generating a deficiency such as a damage or a corrosion in a flow measuring device.

This processing system comprises a processing device for introducing a processing gas into a processing vessel 8 through different flow controllers 38A-38E interposed in a gas introduction system, and the flow measuring device. In the system, the flow measuring device is equipped with an inspection vessel 54 having a prescribed capacity interposed in an inspection passage 52 for connecting the gas introduction system to a gas exhaust system, a pressure gage 58 for detecting the pressure in the inspection vessel, a flow operation part 64 for determining the gas flow rate in the flow controllers based on the rising speed of the detection value of the pressure gage, and a flow measuring control part 62 for controlling the whole operation at the flow measuring time. When feeding a prescribed processing gas into the inspection vessel, an inert gas is fed into the inspection vessel before or after feeding the processing gas, to thereby perform purge operation.


Inventors:
Sasaki, Norikazu
Shimura, Kazue
Mizusawa, Kaneyoshi
Nagaoka, Hideki
Takara, Michifumi
Koo, Akira
Abe, Masaaki
Application Number:
JP2003000001603
Publication Date:
January 08, 2004
Filing Date:
January 07, 2003
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
G01F1/00; G01F25/00; H01L21/00; (IPC1-7): G01F25/00; G01F1/00