Title:
加工廃液処理装置
Document Type and Number:
Japanese Patent JP7446668
Kind Code:
B2
Abstract:
To provide a processing waste liquid treatment apparatus which can reduce a frequency of reproduction processing of an ion exchange resin.SOLUTION: A processing waste liquid treatment apparatus that is connected to a processing device for processing a workpiece and treats a processing waste liquid discharged from the processing device includes: a waste liquid storage tank for storing a processing waste liquid; waste liquid filtration means for filtering the processing waste liquid supplied from the waste liquid storage tank; a first flow channel for supplying the processing waste liquid filtered by the waste liquid filtration means to the processing device; ion exchange means for removing the ions from the processing waste liquid filtered by the waste liquid filtration means and reproducing pure water; and a second flow channel for supplying the pure water produced by the ion exchange means to the processing device.SELECTED DRAWING: Figure 1
Inventors:
Hiroyuki Kashiwagi
Application Number:
JP2019152630A
Publication Date:
March 11, 2024
Filing Date:
August 23, 2019
Export Citation:
Assignee:
Disco Co., Ltd.
International Classes:
B23Q11/10; B01D61/48; B23Q11/00; B24B55/12; C02F1/42; C02F1/469
Domestic Patent References:
JP2016149403A | ||||
JP2000061322A | ||||
JP2005243814A | ||||
JP2018187721A | ||||
JP2017148888A | ||||
JP2012076159A | ||||
JP2012000705A | ||||
JP2011171324A | ||||
JP2005334992A | ||||
JP2256418A | ||||
JP2012521896A | ||||
JP2001509074A | ||||
JP5070861U | ||||
JP2019130617A | ||||
JP2015025417A | ||||
JP2048102U |
Foreign References:
US20110070811 | ||||
US20010017277 | ||||
US6077437 | ||||
US5788826 | ||||
KR100774663B1 |
Attorney, Agent or Firm:
Akira Matsumoto
Tomohiro Okamoto
Takahiro Kasahara
Hideaki Okamoto
Takayuki Okano
Tomohiro Okamoto
Takahiro Kasahara
Hideaki Okamoto
Takayuki Okano
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