Title:
PRODUCTION OF ACID-MODIFIED POLYPHENYLENE ETHER AND POLYSTYRENE RESIN COMPOSITION
Document Type and Number:
Japanese Patent JP3705624
Kind Code:
B2
Abstract:
PURPOSE: To easily produce an acid-modified polyphenylene ether stably producible without deteriorating the working environment while suppressing the lowering of molecular weight and to obtain a polystyrene resin composition having high toughness using the acid-modified polyphenylene ether.
CONSTITUTION: This process for the production of an acid-modified polyphenylene ether comprises the use of (a) 100 pts.wt. of a polyphenylene ether and (b) 0.5-5.0 pts.wt. of fumaric acid or a fumaric acid derivative and optionally (c) 0.1-3.0 pts.wt. of a radical generator and the modification reaction of the polymer at 300-350°C essentially in the absence of solvent. This polystyrene resin composition contains (4) 100 pts.wt. of a styrene polymer having syndiotactic configuration or 100 pts.wt. in total of the styrene polymer and a rubbery elastomer and/or a polyamide, (e) 0.5-5.0 pts.wt. of the above acid- modified polyphenylene ether and optionally (f) 0.5-350 pts.wt. of an inorganic filler.
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Inventors:
Akihiko Okada
Application Number:
JP11673395A
Publication Date:
October 12, 2005
Filing Date:
May 16, 1995
Export Citation:
Assignee:
IDEMITSU KOSAN CO.,LTD.
International Classes:
C08K3/00; C08G65/48; C08K7/00; C08K7/14; C08K9/00; C08K9/04; C08L7/00; C08L21/00; C08L25/00; C08L27/06; C08L71/00; C08L71/12; C08L73/00; C08L77/00; H05K1/03; (IPC1-7): C08G65/48; C08K3/00; C08K7/14; C08K9/04; C08L21/00; C08L25/00; C08L77/00
Domestic Patent References:
| JP3131655A | ||||
| JP2202947A | ||||
| JP2080458A | ||||
| JP2305854A | ||||
| JP63500803A | ||||
| JP63108059A |
Attorney, Agent or Firm:
Tamotsu Otani