PURPOSE: To obtain a Bi-Ti-O thin film having a stable crystal phase and to provide the laminate of a Bi-Sr-Ca-Cu-O thin film and a Bi-Ti-O thin film by forming a Bi-Ti-O thin film in an atmosphere contg. activated oxygen.
CONSTITUTION: A dielectric thin film contg. Bi, Ti and O as the main components is formed on a base plate 13 in a atmosphere contg. activated oxygen gas. An oxide thin film formed by periodically laminating an oxide contg. Bi sputtered from a target 11 and an oxide contg. copper and an alkaline earth element (group IIa) sputtered from a target 12 and an oxide thin film formed by periodically laminating the oxide contg. Bi and oxide contg. Ti sputtered from other targets are periodically aminated on the substrate 13 in an atmosphere contg. activated gaseous oxygen, hence a Bi-Ti-O thin film having several ten nm thickness is obtained with good reproducibility, and the laminate of a Bi-Sr-Ca-Cu-O thin film and a Bi-Ti-O thin film is efficiently obtained.
ADACHI HIDEAKI
SETSUNE KENTARO
