PRODUCTION OF COATING SOLUTON FOR FORMING SILICA FILM, PRODUCTION OF SILICA FILM, SILICA FILM, AND SEMICONDUCTOR DEVICE

Title:

PRODUCTION OF COATING SOLUTON FOR FORMING SILICA FILM, PRODUCTION OF SILICA FILM, SILICA FILM, AND SEMICONDUCTOR DEVICE

Document Type and Number:

Japanese Patent JPH06136124

Kind Code:

A

Abstract:

PURPOSE: To decrease the amt. of a hydrogen halide contained in a coating soln. for forming a silica film and thus obtain the soln. which improves the reliability of an LSI, etc.

CONSTITUTION: The coating soln. is produced by adding water to a mixture comprising a silane compd. represented by RnSiX4-n (wherein R is H or 1-3C alkyl; X is halogen; and n is 1 or 2), a solvent, and an acid catalyst to thereby hydrolyze and polymerize the compd., washing the reaction soln. with a deionized water, evaporating the solvent to obtain a solid product, and adding a coating solvent to the product.

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Inventors:

SHIMAMURA YASUO
MORISHIMA HIROYUKI
UCHIMURA SHUNICHIRO

Application Number:

JP28433192A

Publication Date:

May 17, 1994

Filing Date:

October 22, 1992

Export Citation:

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Assignee:

HITACHI CHEMICAL CO LTD

International Classes:

C08G77/06; C08G77/32; C08J5/18; C09D183/04; H01L21/314; H05K3/28; (IPC1-7): C08G77/06; C08G77/32; C08J5/18; C09D183/04; H01L21/314; H05K3/28

Attorney, Agent or Firm:

Kunihiko Wakabayashi

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