PURPOSE: To enable a method capable of forming a symmetrically three- dimensionally tapered point having a capability of being easy penetrated into a tissue or other material by photoetching.

CONSTITUTION: The process for producing a pointed device by a photochemical process by coating the top and bottom surfaces of a sheet material with a photosensitive photoresist, exposing the photoresist with light through a light- impenetratable mask in the form of an image of the device shaped with a blunt end at the tip of the point 12 to compensate lateral etching during the etching step, said image on the top surface being slightly offset relative to the image on the bottom surface, further exposing a portion of the image of the point of the device on the top surface of the sheet material with light, sad exposure conforming generally to a V-shaped configuration running along the inside perimeter of the point 12, removing the exposed photoresist and then contacting the treated sheet material with an etchant so as to remove the material not protected by the remaining photoresist.