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Title:
PRODUCTION OF DIAZO PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JPH03253843
Kind Code:
A
Abstract:

PURPOSE: To improve the water resistance of an image after development by adding a zirconium compd. and PVA as a binder to a photosensitive liq. compsn.

CONSTITUTION: When a photosensitive liq. compsn. contg. a photosensitive diazo compd., a coupling component and a porous inorg. pigment is applied to the surface of a base and dried to produce a diazo photosensitive material, a zirconium compd. and PVA as a binder are added to the photosensitive liq. compsn. The PVA may be completely or partially saponified PVA or carboxyl modified or unmodified PVA. The zirconium compd. used is required only to have solubility in water and may be zirconium tetrachloride, zirconyl chloride or basic zirconyl chloride. A diazo photosensitive material having superior water resistance of an image after development can be obtd. by coating with a single layer.


Inventors:
YABUTA KENJI
Application Number:
JP5321990A
Publication Date:
November 12, 1991
Filing Date:
March 05, 1990
Export Citation:
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Assignee:
MITSUBISHI PAPER MILLS LTD
International Classes:
G03C1/52; G03C1/60; G03C1/62; G03C1/74; G03C1/76; (IPC1-7): G03C1/52; G03C1/60; G03C1/62; G03C1/74; G03C1/76