Title:
PRODUCTION OF DISILANYLORGANOPOLYSILOXANE
Document Type and Number:
Japanese Patent JP3158987
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain the subject compound capable of film formation at low temperatures, giving a film high in hardness and heat resistance while developing no crack due to its volume shrinkage at high temperatures, and effective as a surface treating agent, binder or reinforcing agent for inorganic materials.
SOLUTION: This polysiloxane, disilanylorganopolysiloxane of the formula R1cSi2(OR2)dO(6-c-d)/2 (R1 and R2 are each a monovalent hydrocarbon group; (c) and (d) satisfy the following relationships: 0≤(c)≤3,0<(d)<6, 0<(c+d)<6), is obtained by hydrolyzing condensation of a hydrolyzable group-contg. disilane of the formula R1aSi2X6-a (R1 is H or a monovalent hydrocarbon group; X is a hydrolyzable group; (a) is 0, 1, 2 or 3) and/or a partially hydrolyzed condensate thereof in the presence of a catalyst, i.e., an alkali fluoride or a dibasic organic acid plus a metallic condensation catalyst.
Inventors:
Tomohisa Suzuki
Kenji Yamamoto
Kenichi Isobe
Kenji Yamamoto
Kenichi Isobe
Application Number:
JP22858295A
Publication Date:
April 23, 2001
Filing Date:
August 14, 1995
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08G77/04; C08G77/08; C08G77/48; (IPC1-7): C08G77/48
Domestic Patent References:
| JP6228318A | ||||
| JP59108033A |
Attorney, Agent or Firm:
Takashi Kojima