Title:
PRODUCTION OF FLUORIDE THIN COATING
Document Type and Number:
Japanese Patent JP3665682
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing transparent and dense fluoride thin coating extremely small in the intrusion of impurities such as carbon, oxygen, organic matter or the like and having high purity.
SOLUTION: This producing method is the one in which a fluorine-contg. gas and the gases of volatile organic metal compounds 13a to c are brought into reaction in the state of vapor phases in a reaction vessel to produce fluoride thin coating. In this case, fluorine-contg. gas plasma obtd. by activating a fluorine-contg. gas by microwaves under the condition of electron cyclotron resonance is used as a fluorine source, which is brought into reaction with the gases 13a to c of volatile organic metal compounds outside of the plasma generating region to deposite fluoride on a substrate 4.
Inventors:
Akio Konishi
Ryohei Terai
Youji Kawamoto
Ryohei Terai
Youji Kawamoto
Application Number:
JP18136496A
Publication Date:
June 29, 2005
Filing Date:
June 21, 1996
Export Citation:
Assignee:
Japan Yamamura Glass Co., Ltd.
International Classes:
G02B6/13; C03B8/04; C03B19/14; C03C3/32; C03C17/02; C03C17/22; C04B41/50; C04B41/85; C23C16/22; C23C16/30; C23C16/452; C23C16/511; H01S3/17; (IPC1-7): C23C16/22; C03B8/04; C03B19/14
Domestic Patent References:
| JP5024875A | ||||
| JP7188271A | ||||
| JP6287757A | ||||
| JP4333006A | ||||
| JP5043256A | ||||
| JP6092676A |
Attorney, Agent or Firm:
Mitsuru Uchiyama