Title:
PRODUCTION OF GRATING PATTERN
Document Type and Number:
Japanese Patent JPH03139602
Kind Code:
A
Abstract:
PURPOSE:To form fine patterns with good controllability by irradiating a substrate with a focused ion beam from the direction inclined by a specific angle to selectively generate lattice defects in the substrate in the regions irradiated with the ion beam and selectively etching away the regions irradiated with the ion beam. CONSTITUTION:The substrate 1 is irradiated with the focused ion beam 5 from the direction inclined by the angle larger than theta in the direction perpendicular to the substrate 1 when the average value of the range of the ion beam in the substrate 1 is RP, the average value of the spread in a transverse direction is DELTAX and theta is the value derived from tantheta=RP/DELTAX. The lattice defects are generated only in the regions 6 irradiated with the ion beam in the substrate 1 and the regions 6 irradiated with the ion beam are selectively etched away by the wet etching. The controllability of shape working is improved in this way and the fine lattice patterns are formed. The influence by the intrasurface nonuniformity of a resist is eliminated.
Inventors:
MORIMOTO HIROAKI
MATSUDA SHUICHI
MATSUDA SHUICHI
Application Number:
JP27924189A
Publication Date:
June 13, 1991
Filing Date:
October 25, 1989
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G02B5/18; (IPC1-7): G02B5/18
Attorney, Agent or Firm:
Masuo Oiwa (2 outside)