Title:
PRODUCTION OF HIGH-PURITY ACETIC ACID
Document Type and Number:
Japanese Patent JP3244385
Kind Code:
B2
Abstract:
PURPOSE: To provide a method for producing acetic acid by which organic iodides and carbonyl impurities in the acetic acid formed by a carbonylating method under the actions of a rhodium catalyst are reduced.
CONSTITUTION: The method for producing high-purity acetic acid is to bring a solution containing carbonyl impurities into contact with water, separate and remove the carbonyl impurities and thereby keep the acetaldehyde concentration in the reactional solution at ≤400ppm in the method for producing the acetic acid by continuously reacting methanol with carbon monoxide in the presence of a rhodium catalyst, an iodide and methyl iodide.
Inventors:
Hiroyuki Miura
Masahiko Shimizu
Takashi Sato
Masahiko Shimizu
Takashi Sato
Application Number:
JP19652494A
Publication Date:
January 07, 2002
Filing Date:
August 22, 1994
Export Citation:
Assignee:
Daicel Chemical Industry Co., Ltd.
International Classes:
B01J31/16; C07B61/00; C07C51/12; C07C51/44; C07C53/08; (IPC1-7): C07C51/12; C07C51/44; C07C53/08
Domestic Patent References:
| JP725814A | ||||
| JP4295445A | ||||
| JP4266843A | ||||
| JP6501015A |
Other References:
【文献】国際公開95/5356(WO,A1)
Attorney, Agent or Firm:
Kaoru Furuya (3 outside)