Title:
PRODUCTION OF HIGH PURITY HYDROGEN PEROXIDE SOLUTION
Document Type and Number:
Japanese Patent JP3849724
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a hydrogen peroxide solution, in which impurities, particularly silicon compounds, aluminum compounds and tin compounds, are removed to remarkably low concentration, by treating hydrogen peroxide with an ion exchange resin and an ultrafiltration membrane.
SOLUTION: The ultrafiltration membrane having ≤0.15μm average pore diameter is used. The silicon compounds are effectively removed particularly in the case of using the ultrafiltration membrane having $0.05μm average pore diameter. The material for the ultrafiltration membrane is selected from a fluorocarbon resin, a polyolefin resin, a polyacrylonitrile resin or the like. The shape is not limited. The concentration of hydrogen peroxide to be used is not limited, but 5-70wt.% hydrogen peroxide is generally practicable. The temp. of the hydrogen peroxide solution to be treated with the ultrafiltration membrane is preferably as low as possible and generally in the range from the freezing point to 30°C. A resin mixture of a strong acidic cation exchange resin with a basic anion exchange resin in an optional mixing ratio is used for the ion exchange resin.
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Inventors:
Yoshiyuki Aoki
Yuichi Serizawa
Nagai Kazunori
Yuichi Serizawa
Nagai Kazunori
Application Number:
JP2656796A
Publication Date:
November 22, 2006
Filing Date:
February 14, 1996
Export Citation:
Assignee:
Mitsubishi Gas Chemical Co., Ltd.
International Classes:
B01D61/14; C01B15/013; B01D71/06; C02F1/42; (IPC1-7): C01B15/013; B01D61/14; B01D71/06; C02F1/42
Domestic Patent References:
| JP5505749A | ||||
| JP7033408A | ||||
| JP5017105A | ||||
| JP4505659A | ||||
| JP9503990A |