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Patent Searching and Data


Title:
PRODUCTION OF INDANEPENTAOL DERIVATIVES AND RELATED COMPOUNDS
Document Type and Number:
Japanese Patent JPS5287153
Kind Code:
A
Abstract:
Compounds are provided having the structure wherein n is 1, 2 or 3, m is 0, 1 or 2, R1+L, R2, R3, R4 and R5 may be the same or different and can be hydrogen, lower alkyl, halo-lower alkyl, acyl, lower alkoxy-carbonyl amido or lower alkoxylakylene, X is a straight or branched bivalent aliphatic radical and Y is

Inventors:
FUREDERITSUKU PEETAA HOOKU
JIYOSEFU EDOWAADO SANDEIIN
JIYOISU AN REIDO
Application Number:
JP344877A
Publication Date:
July 20, 1977
Filing Date:
January 14, 1977
Export Citation:
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Assignee:
SQUIBB & SONS INC
International Classes:
C07D295/08; A61K31/13; A61K31/215; A61K31/27; A61K31/395; A61K31/40; A61K31/435; A61K31/495; A61K31/535; A61K31/5375; A61K31/54; A61K31/55; A61P9/12; C07C17/32; C07C31/137; C07C67/00; C07C213/00; C07C215/42; C07C217/52; C07C219/24; C07C239/00; C07C269/00; C07D211/14; C07D211/32; C07D211/42; C07D211/46; C07D211/54; C07D211/70; C07D213/20; C07D223/04; C07D295/03; C07D295/04; C07D295/096; C07D295/02; (IPC1-7): A61K31/40; A61K31/435; A61K31/495; A61K31/535; A61K31/54; A61K31/55; C07C91/32; C07C93/14; C07C93/26; C07C103/10; C07D207/02; C07D211/14; C07D223/04; C07D241/38; C07D265/28; C07D279/10