PURPOSE: To prevent the deflection of an ink droplet by exposing the crystallographic plane of the specific surface azimuth around the orifice of an ink jet nozzle and chemically etching the residual part of a nozzle front surface at a speed faster than this plane to form a lip around the orifice.

CONSTITUTION: A surface 55 is eroded by the irradiation 60 with one ion beam of sputter erosion forming a nozzle having a tray-shaped orifice 55 until a plurality of (111) crystallographic planes 56 are formed. Starting from the countersunk orifice, a front surface 35 and the tray-shaped orifice are equally exposed to an anisotropic chemical etching reagent. This anisotropic chemical etching reagent etches a (100) crystallographic plane 35 at a speed higher than the etching speed of the (111) crystallographic plane 56 by 35-400 times. Further, by forming the surface 55 becoming the (111) crystallographic plane 56, a hollow lip part is allowed to remain so as to mask a plurality of high index crystallographic planes.