Title:
PRODUCTION OF ITO SPUTTERING TARGET
Document Type and Number:
Japanese Patent JPH0867977
Kind Code:
A
Abstract:
PURPOSE: To stably produce a high density ITO target with high productivity without especially requiring expensive new equipment.
CONSTITUTION: When a powdery mixture consisting essentially of indium oxide and tin oxide is press-compacted and sintered to produce an ITO target, the sintering is carried out at 1,600-1,700°C in an atmosphere of oxygen pressurized to 1 to <3atm.
Inventors:
NAKAJIMA KOICHI
SATO NORIAKI
SATO NORIAKI
Application Number:
JP4360695A
Publication Date:
March 12, 1996
Filing Date:
February 08, 1995
Export Citation:
Assignee:
JAPAN ENERGY CORP
International Classes:
C04B35/00; C04B35/495; C23C14/34; H01B13/00; H01L21/203; (IPC1-7): C23C14/34; C04B35/495; H01B13/00; H01L21/203
Attorney, Agent or Firm:
Takeshi Imai
Next Patent: METHOD FOR SOLDERING TARGET FOR SPUTTERING