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Title:
PRODUCTION OF LEAD TITANATE ZIRCONATE-BASED THIN FILM
Document Type and Number:
Japanese Patent JPH0543242
Kind Code:
A
Abstract:

PURPOSE: To easily obtain a thin film contg. lead titanate zirconate with good reproducibility by sputtering the lead composition in the thin film by a controlled high-frequency power.

CONSTITUTION: A thermally oxidized film is formed on a substrate of quartz glass, etc., and then a platinum film, etc., are formed thereon by DC sputtering to obtain a desired substrate. The substrate is heated to ≤200°C, and a lead titanate zirconate sintered body as the target is sputtered by the high-frequency magnetron sputtering method to form a thin film on the substrate. The obtained thin film is heat-treated in an oxidizing atmosphere at the heating and cooling rate of ≤2°C/min to produce a lead titanate zirconate-based thin film consisting essentially of the lead titanate zirconate Pb(ZrxTi1-x)O3.


Inventors:
TORII KAZUNARI
KAGA TORU
KUSHIDA KEIKO
TAKEDA EIJI
Application Number:
JP19772291A
Publication Date:
February 23, 1993
Filing Date:
August 07, 1991
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
C01G25/00; H01L37/00; H01L41/187; (IPC1-7): C01G25/00; H01L37/00; H01L41/187
Attorney, Agent or Firm:
Ogawa Katsuo