PURPOSE: To easily obtain a thin film contg. lead titanate zirconate with good reproducibility by sputtering the lead composition in the thin film by a controlled high-frequency power.
CONSTITUTION: A thermally oxidized film is formed on a substrate of quartz glass, etc., and then a platinum film, etc., are formed thereon by DC sputtering to obtain a desired substrate. The substrate is heated to ≤200°C, and a lead titanate zirconate sintered body as the target is sputtered by the high-frequency magnetron sputtering method to form a thin film on the substrate. The obtained thin film is heat-treated in an oxidizing atmosphere at the heating and cooling rate of ≤2°C/min to produce a lead titanate zirconate-based thin film consisting essentially of the lead titanate zirconate Pb(ZrxTi1-x)O3.
KAGA TORU
KUSHIDA KEIKO
TAKEDA EIJI
