Title:
PRODUCTION OF MAGNESIUM OXIDE FILM
Document Type and Number:
Japanese Patent JP3836184
Kind Code:
B
Abstract:
PROBLEM TO BE SOLVED: To produce a dense MgO film, excellent in orienting properties and having a small crystal grain diameter by forming the MgO film on a substrate in the presence of a plasma in an atmosphere containing H in an excited or an ionized state.
SOLUTION: A substrate 8 is attached to a rotatable substrate holder 2 installed in the upper part of a vapor deposition chamber 1 and a granular MgO 6 is then placed in a crucible 5 arranged at the bottom of the vapor deposition chamber 1. The interior of the chamber 1 is subsequently evacuated to 10-5 to 10-6Torr and a current is then made to flow through heaters 11 to heat the substrate 8 at a prescribed temperature. An inert gas for generating a plasma is subsequently fed from a discharge gas feed port 10 of a pressure gradient type plasma gun 3 thereinto to regulate the internal pressure to 10-3 to 10-4Torr. A reactive gas is then fed from a feed port 9. A voltage is subsequently applied from a DC power source 4 across the plasma gun 3 and the crucible 5 to thereby carry out the regulation so as to provide 100-150 A discharge current. H2 gas is then introduced from the feed port 9 or 10 thereinto to converge a plasma stream 7 on the crucible 5. Thereby, the MgO 6 is evaporated to form the MgO film on the substrate 8.
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Inventors:
Furuya, Eiji
Application Number:
JP1996000135959
Publication Date:
August 04, 2006
Filing Date:
May 01, 1996
Export Citation:
Assignee:
CHUGAI RO CO LTD
International Classes:
C30B23/08; C30B29/16; C23C14/08; H01J9/02; H01J11/02; C30B23/08; C30B29/10; C23C14/08; H01J9/02; H01J11/02; (IPC1-7): C30B29/16; C23C14/08; C30B23/08; H01J9/02; H01J11/02