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Title:
PRODUCTION METHOD FOR INORGANIC POLYMER COMPOUND, INORGANIC POLYMER COMPOUND AND INORGANIC POLYMER COMPOUND FILM
Document Type and Number:
Japanese Patent JP2002128898
Kind Code:
A
Abstract:

To provide a production method for an inorganic polymer compound capable of forming a film which has the functions such as an improvement of wetting toward a substrate, an adhesion and a corrosion resistance.

The production method for the inorganic high molecular compound is such that a Zr-alkoxide and/or B-alkoxide of 0.05-0.2 mol (2), a silica sol of 0.01-0.3 mol in conversion as SiO2 (3), a acid and/or metallic salt of 1/100-1/30 mol (4), a water and/or acetic acid of 1-4 mol (5), wherein each mol- value is based on 1 mol of the total mol-values of more than two kinds selected from the three kinds of a tetraalkyl silicate, an alkylalkoxy silicate and a silica condensation product (1), and a hydrophilic organic solvent (6), are provided, thereafter the raw materials mentioned in (1)-(6) are partially or totally refluxed and finally the total amount is mixed to produce the inorganic polymer compound.


Inventors:
UCHIDA FUMIO
SHIMIZU CHIEMI
IMAI HIROKI
NISHINO HIDEYA
ONO TADASHI
FUJITA TOMOHARU
Application Number:
JP2000326435A
Publication Date:
May 09, 2002
Filing Date:
October 26, 2000
Export Citation:
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Assignee:
FUJI CHEMICAL KK
SHIMIZU CONSTRUCTION CO LTD
International Classes:
B32B9/00; C01B33/113; C01B33/12; C08G79/00; C08G79/08; C08K3/36; C08K5/09; C08L83/02; C08L85/00; C08L85/04; C09D1/00; C09D5/00; C09D183/00; C09D185/00; (IPC1-7): C08G79/00; B32B9/00; C01B33/113; C01B33/12; C08G79/08; C08K3/36; C08K5/09; C08L83/02; C08L85/00; C08L85/04; C09D1/00; C09D5/00; C09D183/00; C09D185/00
Attorney, Agent or Firm:
Masatake Shiga (3 outside)